Course of Material & Life Science, Division of Advanced Science and Biotechnology
Graduate School of Engineering, Osaka University
Laboratory Equipments
M1 Bldg.Advanced Research (AR) Bldg.
Ultra Clean Room (UCR)Ultra Clean Facility (UCF)
M1 Bldg.
Ge furnace
SiC furnace
Vacuum evaporator （bell jar）
Two-source vacuum evaporator
Arc plasma gun / sputter desposition system
Hellicon sputter deposition system
Vacuum Rapid thermal annealing
（MILA-5000UHV）
Rapid thermal annealing（MILA-5000）
Rapid thermal annealing（MILA-3000）
UV ozonizer
Scanning probe microscopy
Prober (Oyama) with Keithley 4200-SCS
Temperature variable (80-650K) prober
Prober (Vector semiconductor)
with Agilent B1500A
Spectroscopic ellipsometry
Polishing Machine
Photoluminescence spectroscopy
Molecular beam epitaxy / ECR plama system
4-axis x-ray diffractometer
Advanced Research (AR) Bldg.
X-ray imaging system
Molecular beam epitaxy system
Ultra Clean Room (UCR)
Reactive ion etching (EIKO)
Shared use
Thermal desorption spectroscopy
Transmission electron microscope
Total Reflection X-ray Fluorescence Spectrometer
Ultra Clean Facility (UCF)
Ultra Clean Facility(UCF)
High-density plasma treatment system
Molecular beam epitaxy / XPS system
Asher
Rapid thermal annealing
SiC activation annealing
Three-target sputter deposition system (Canon ANELVA)
Sputter deposition system (for X-ray target)
Optical microscope
Laser lithography
Reactive ion etching (ANELVA)
Mask aligner
Three-source vacuum evaporator
Liquid-source plasma CVD
Shared use
Scanning x-ray photoelectron spectroscopy
Scanning electron microscope
Focused ion beam system
Wet bench